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์ „๋ฌธ์ง€์‹ 73๊ฑด

Scanning Probe Microscope ์ด๋ž€? 1-1. SPM์˜ ์Šค์บ๋„ˆ 1-2. ์Šค์บ๋„ˆ ๊ตฌ์กฐ์™€ ์ž‘๋™ 1-3. ์Šค์บ๋„ˆ์˜ ๋ณธ์งˆ์ ์ธ ๋ฌธ์ œ์ ๋“ค. 1-3-1. Intrinsic ๋น„์„ ํ˜•์„ฑ 1-3-2. Hysteresis 1-3-3. Creep 1-3-4. Aging 1-3-5. Cross Coupling 1-4. ์Šค์บ๋„ˆ ๋ฌธ์ œ์ ๋“ค์˜ ํ•ด๊ฒฐ๋ฐฉ๋ฒ• 1-4-1. Software
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์•ผ ํ•œ๋‹ค๋Š” ์ ์ด๋‹ค. โ…ค ๋‹ค๋ฅธ ๊ธฐ๊ธฐ์™€์˜ ๋น„๊ต๋ถ„์„ ํƒ์นจํ˜• ์›์ž ํ˜„๋ฏธ๊ฒฝ(scanning probe microscope ;SPM)์ด๋ž€ ๋‹ค์–‘ํ•œ ๋ฐฉ์‹์˜ ํƒ์นจ(probe)์œผ๋กœ ์‹œ๋ฃŒ์˜ ํ‘œ๋ฉด์„ ์Šค์บ”ํ•˜์—ฌ ์›์ž ์ง€๋ฆ„์˜ ์ˆ˜์‹ญ ๋ถ„์˜ 1์ธ 0.01๋‚˜๋…ธ๋ฏธํ„ฐ(nm) ์ˆ˜์ค€๊นŒ์ง€ ์ธก์ •ํ•  ์ˆ˜ ์žˆ๋Š” ์ œ3์„ธ๋Œ€ ํ˜„๋ฏธ๊ฒฝ์ด๋‹ค.
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์•ผ ํ•œ๋‹ค๋Š” ์ ์ด๋‹ค. โ…ค ๋‹ค๋ฅธ ๊ธฐ๊ธฐ์™€์˜ ๋น„๊ต๋ถ„์„ ํƒ์นจํ˜• ์›์ž ํ˜„๋ฏธ๊ฒฝ(scanning probe microscope ;SPM)์ด๋ž€ ๋‹ค์–‘ํ•œ ๋ฐฉ์‹์˜ ํƒ์นจ(probe)์œผ๋กœ ์‹œ๋ฃŒ์˜ ํ‘œ๋ฉด์„ ์Šค์บ”ํ•˜์—ฌ ์›์ž ์ง€๋ฆ„์˜ ์ˆ˜์‹ญ ๋ถ„์˜ 1์ธ 0.01๋‚˜๋…ธ๋ฏธํ„ฐ(nm) ์ˆ˜์ค€๊นŒ์ง€ ์ธก์ •ํ•  ์ˆ˜ ์žˆ๋Š” ์ œ3์„ธ๋Œ€ ํ˜„๋ฏธ๊ฒฝ์ด๋‹ค.
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  • ์ตœ๊ทผ 2์ฃผ ํŒ๋งค ์ด๋ ฅ ์—†์Œ
์ „์ž๋ฅผ ๋ฐœ์ƒ์‹œ์ผœ์„œ, ์„ผ์„œ๋กœ ๋ฐ›์•„๋“ค์—ฌ ๊ด€์ฐฐํ•  ์ˆ˜ ์žˆ๋„๋ก ํ•œ๋‹ค. SPM(Scanning Probe Microscope)์€ 1982๋…„์— IBM. Zurich ์—ฐ๊ตฌ์†Œ์˜ G.Binning, H.Roher์— ์˜ํ•ด ๋ฐœ๋ช… (1986๋…„์˜ ๋…ธ๋ฒจ๋ฌผ๋ฆฌํ•™์ƒ์ˆ˜์ƒ) ๋๋˜ STM(Scanning Tunneling Microscope)์˜ ์›๋ฆฌ๋กœ๋ถ€ํ„ฐ ํƒ„์ƒ๋˜์—ˆ๋‹ค. ๋ฏธ์„ธํ•œ ํƒ
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Electron microscope(EM) • SEM (scanning electron microscope) • FESEM (field emission scanning electron microscope) • TEM (transmission electron microscope) • HRTEM (high resolution transmission electron microscope) Scanning probe microscope(SPM) • STM(scanning tun
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๋…ผ๋ฌธ 1๊ฑด

scanning electron microscope. The voltage at zero current in low electric field is the lowest at 0.3 % OTS treated SiO2 film with hybrid type. SiO2 films changed from inorganic to hybrid or organic properties according to the increase of OTS content. OTS treated SiO2 films with hybrid properties dec
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  • ๋ฐœํ–‰๊ธฐ๊ด€
  • ์ €์ž
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